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Patterning and treatment of SiO2 thin films °á°úº¸°í¼­ ÀÎÇÏ´ëÇб³ A£«

Patterning and treatment of SiO2 thin films °á°úº¸°í¼­ ÀÎÇÏ´ëÇб³ A£«

Patterning and treatment of SiO2 thin films °á°úº¸°í¼­ ÀÎÇÏ´ëÇб³ A£« / 1. ¼­·Ð (½ÇÇè°³¿ä, ¸ñÀû, Çʿ伺 µîÀ» ¼­¼ú) 2. ½ÇÇè¹æ¹ý 3. ½ÇÇè°á°ú ¹× ºÐ¼® 4. °á·Ð 5. Process problem / 1. ¼­·Ð (½ÇÇè°³¿ä, ¸ñÀû, Çʿ伺 µîÀ» ¼­¼ú) SiO2(½Ç¸®Ä«) ¹Ú¸·Àº ¹ÝµµÃ¼, ±¤ÀüÀÚ ±â±â ¹× ³ª³ë±â¼ú µî ´Ù¾çÇÑ ÀÀ¿ë ºÐ¾ß¿¡¼­ Áß¿äÇÑ ¿ªÇÒÀ» ÇÏ°í ÀÖ´Ù. ÀÌ·¯ÇÑ ¹Ú¸·Àº ±× Ư¼º°ú ±â´É¼º ´ö¡¦
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Patterning and treatment of SiO2 thin films ¿¹ºñº¸°í¼­ A£«

Patterning and treatment of SiO2 thin films ¿¹ºñº¸°í¼­ A£«

Patterning and treatment of SiO2 thin films ¿¹ºñº¸°í¼­ A£« / 1. ½ÇÇè ¸ñÀû 2. ½ÇÇè ÀÌ·Ð 1) ÇöóÁ (Plasma) ¶õ 2) ¹ÝµµÃ¼ Á¦Á¶ °øÁ¤°ú Á¤ÀÇ 3) Lithography ¶õ 4) ½Ä°¢(etching)ÀÇ Á¾·ù¿Í Á¤ÀÇ 5) P-N Á¢ÇÕÀ̶õ 6) ¹Ú¸·ÀÇ ½Ä°¢ ¹× ÁõÂø °øÁ¤À» È°¿ëÇÑ ¼ÒÀڵ鿡 ´ëÇÑ ¿ø¸®¿Í ±¸Á¶ 7) È­ÇаøÇÐÀü°øÀÚ°¡ ¹ÝµµÃ¼ »ê¾÷¿¡¼­ ÇÊ¿äÇÑ ÀÌÀ¯ (ÀÚ½ÅÀÇ »ý°¢À» ÷ºÎ) Âü°í¹®Çå (»ó¡¦
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¼¼¶ó¹Í °øÇÐ ½ÇÇè º¸°í¼­ (Pulsed laser deposition of oxide thin films and their analysis)

¼¼¶ó¹Í °øÇÐ ½ÇÇè º¸°í¼­ (Pulsed laser deposition of oxide thin films and their analysis)

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MIS-What Should Films Do About BYOD

MIS-What Should Films Do About BYOD

1. What are the advantages and disadvantages of allowing employees to use their .. / 1. What are the advantages and disadvantages of allowing employees to use their personal mobile devices for work. 2. What people, organization, and technology factors should be addressed when deciding whether to allow employees to use their personal mobile devices for work¡¦
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