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Patterning and treatment of SiO2 thin films °á°úº¸°í¼ ÀÎÇÏ´ëÇб³ A£« / 1. ¼·Ð (½ÇÇè°³¿ä, ¸ñÀû, Çʿ伺 µîÀ» ¼¼ú) 2. ½ÇÇè¹æ¹ý 3. ½ÇÇè°á°ú ¹× ºÐ¼® 4. °á·Ð 5. Process problem / 1. ¼·Ð (½ÇÇè°³¿ä, ¸ñÀû, Çʿ伺 µîÀ» ¼¼ú) SiO2(½Ç¸®Ä«) ¹Ú¸·Àº ¹ÝµµÃ¼, ±¤ÀüÀÚ ±â±â ¹× ³ª³ë±â¼ú µî ´Ù¾çÇÑ ÀÀ¿ë ºÐ¾ß¿¡¼ Áß¿äÇÑ ¿ªÇÒÀ» ÇÏ°í ÀÖ´Ù. ÀÌ·¯ÇÑ ¹Ú¸·Àº ±× Ư¼º°ú ±â´É¼º ´ö¡¦
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