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| ��쩸t 4.Photolithography 怨듭젙 �닚�꽌 Cleaning -` PR coating -` Soft Baking -` Mask align & Exposure -` Develop -` Hard baking -` Cr etching -` Strip 5.�떎�뿕諛⑸쾿 : �몺Cr�씠 利앹갑�맂 湲고뙋 Cleaning�쓣 �븳�떎.(Isopropyl alcohol�뿉 �빟 10遺� 媛��웾 Ultra sonic泥섎━ -`DI water -`gas濡� drying) �몼Spin coater�쐞�뿉 湲고뙋�쓣 �삱由ш퀬 吏꾧났 �옟��� �썑 PR�쓣 肉뚮━怨� 肄뷀똿�쓣 �븳�떎.(500rpm : 10珥�, 3000rpm : 30珥�, 1000rpm :10珥�)... / 1.�떎�뿕�젣紐� : Photoli |
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| 蹂� �옄猷뚮뒗 諛섎룄泥닿났�젙�닚�꽌�뿉 ����빐 �옉�꽦�맂 由ы룷�듃�엯�땲�떎. 諛섎룄泥닿났�젙�닚�꽌 / 1. polysilicon creation 2. crystal pulling 3. wafer slicing 4. lapping , etching and pollishing, cleaning 1) wafer lapping 2) wafer etching 3) waf��� |
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| �뿭�궪�닾�쓽 �썝由ъ�� �뿭�궪�닾留됱쓽 醫낅쪟 諛� 湲곕뒫怨� �듅�꽦�쓣 �궡�렣蹂닿퀬, �뿭�궪�닾 �꽕鍮꾩쓽 �쟾泥섎━��� �뿭�궪�닾留됱쓽 CLEANING怨� 蹂닿���뿉 ����빐�꽌 �젙由ы븳 �옄猷뚯엯�땲�떎. 留롮�� 李멸퀬媛� �엳�쑝由щ씪 �깮媛곹븯硫�, �떎�뱾 A+ 諛쏆쑝�떆湲� 諛붾엻�땲�떎. / �뀪. �뿭�궪�닾留� 遺꾨━ 媛쒖슂 1. �뿭�궪�닾 �썝由� 2. �뿭�궪�닾留됱쓽 醫낅쪟 3. �뿭�궪�닾留됱쓽 湲곕뒫 諛� �듅�꽦 �뀫. �뿭�궪�닾 �꽕鍮꾩쓽 �쟾泥섎━ 1. �뿭�궪�닾留됱뿉 �쁺�뼢�쓣 二쇰뒗 �슂�냼 2. SCALE �젣�뼱 �뀬. �뿭�궪�닾留됱쓽 CLEANING怨� 蹂닿�� 1. MEMBRANE CLEANING 2. FOULING �쁽�긽怨� �젣嫄곕갑踰� 3. 誘몄깮臾� CONTROLS 4. MODULE�쓽 蹂닿�� / Tubular module��� good fluid hy��� |
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| ��� (ex: rice, salads, etc.) 쨌 Cleaning duties 19992000 Waiter TGI Fridays���, Korea 쨌 Dish Washing 쨌 Serving of customers 쨌 Effectively handling customer enquiries and complaints 쨌 Worked on console registry 쨌 Cleaning duties 쨌 Handled and sent orders 1998 - 1999 Kitchen Hand Embassado Hotel���, Korea 쨌 Maintained kitchens cleanli |
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| [怨듯븰] �뿴援먰솚湲�[Heat Exchanger] 醫낅쪟 諛� �듅吏� / �뿴援먰솚湲�(Heat Exchanger) �뿴援먰솚湲� �꽌濡� �삩�룄媛� �떎瑜닿퀬, 怨좎껜踰쎌쑝濡� 遺꾨━�맂 �몢 �쑀泥대뱾 �궗�씠�뿉 �뿴援먰솚�쓣 �닔�뻾�븯�뒗 �옣移섎�� �뿴援먰솚湲곕씪 �븯硫�, �궃諛�, 怨듦린議고솕, �룞�젰諛쒖깮, �룓�뿴�쉶�닔 �벑�뿉 �꼸由� �씠�슜�맂�떎. 1. �궗�슜紐⑹쟻�뿉 �뵲瑜� 遺꾨쪟 1) Heater : �쑀泥대�� 媛��뿴�븯��� |
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| ch[1] / 1.You ought to have your coat _. (A) clean and press(B) cleaned and pressed (C) cleaning and pressing (D) cleaning and pressed 2.Before I go to the job interview, I have to _. (A) have cleaned my suit(B) had clean my suit (C) had my suit clean(D) have my suit cleaned 3. Before she hands in her paper, she is going to have a native speaker _. ��� |
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| 媛��뒪 湲덉냽 �븘�겕�슜�젒�쓽 遺꾨쪟��� �옱猷� 泥��젙�옉�슜 �벑�뿉 ����빐 議곗궗�븳 �옄猷뚯엯�땲�떎. GMAW媛��뒪湲덉냽�븘�겕�슜�젒 / 1. GMAW(媛��뒪 湲덉냽 �븘�겕�슜�젒)�쓽 遺꾨쪟 2. �슜�젒�옱猷� 3. 泥��젙�옉�슜(Cleaning action) / 1) Ar 諛� He 媛��뒪 Ar怨� He媛��뒪�뒗 �솕�븰�쟻�쑝濡� 遺덊솢�꽦�씠誘�濡� �슜�젒遺��뿉�꽌 �떎瑜� 臾쇱쭏怨� 寃고빀�븯吏� �븡�뒗�떎. 洹몃윭�굹, �씠�뱾��� <�몴2>�뿉�꽌 蹂대뒗 諛붿�� 媛숈씠 諛��룄, �뿴 �쟾�룄�룄, �쟾湲� �쟾�룄�룄 諛� �씠�삩�솕�뿉�꼫吏� �벑�뿉 �엳�뼱�꽌 而ㅻ떎��� 李⑥씠媛� �엳湲� �븣臾몄뿉 �븘�겕 �듅�꽦 諛� 蹂댄샇 �슚怨쇱뿉�룄 李⑥씠媛� �엳�떎. Ar��� 怨듦린蹂대떎 �빟 1.4諛� 臾닿굅�슫 諛섎㈃, He�뒗 �빟 0.14諛� �젙�룄 媛�蹂띾떎. �뵲�씪�꽌, �븘�옒蹂닿린 �옄�꽭�뿉�꽌 �슜�쑖湲덉냽�쓣 蹂댄샇�븳�떎�뒗 愿��젏�뿉�꽌 蹂닳�� |
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| 珥덉쓬�뙆�뿉 愿��븳 怨좎같 �뿈珥덉쓬�뙆 / �뿈珥덉쓬�뙆 �뿈吏꾨떒 珥덉쓬�뙆 �뿈珥덉쓬�뙆�슂踰�[擁낂윹力�筌곫퀡, supersonic wave treatment] �뿈珥덉쓬�뙆�꽭泥�[擁낂윹力€킋譯�, ultrasonic cleaning] �뿈�궛�뾽�슜 珥덉쓬�뙆 �뿈珥덉쓬�뙆��� �룞臾� / �뿈�궛�뾽�슜 珥덉쓬�뙆 珥덉쓬�뙆 寃��궗�뒗 �씪諛섏쟻�쑝濡� �옱猷� �냽�쓽 寃고븿�쓣 李얘굅�굹 �삉�뒗 臾쇱껜�쓽 �몢猿섎�� 痢≪젙�븯�뒗 �뜲 �궗�슜�릺�뒗 鍮꾪뙆愿� 寃��궗�쓽 �븳 醫낅쪟�씠�떎. 2~10 MHz�쓽 二쇳뙆�닔媛� �씪諛섏쟻�씤�뜲, �듅蹂꾪븳 寃쎌슦 �떎瑜� 二쇳뙆�닔 踰붿쐞�룄 �궗�슜�맂�떎. �닔�룞 �삉�뒗 �옄�룞�솕�맂 寃��궗�뒗 �쁽��� �깮�궛 怨듭젙�뿉�꽌 �븘�닔�쟻�씤 �슂�냼�씠�떎. ���遺�遺꾩쓽 湲덉냽肉먯븘�땲�씪 �뵆�씪�뒪�떛怨� �슦二쇳빆怨듭슜 蹂듯빀泥대뱾�룄 寃��궗�뿉 �쟻�슜�맆 �닔 �엳�떎. �궙��� 二쇳뙆�닔�쓽 珥덉쓬�뙆 (50kHz~500kH��� |
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