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Wafer cleaning
Types and sources of contamination
Particles- 癒쇱��, 苑껉��猷�, clothing particles, 諛뺥뀒由ъ븘 �벑. 蹂댄넻�쓽 怨듦컙(1�걧鍮� �뵾�듃 �븞�뿉)�뿉�뒗0.5 micron �씠�긽 �겕湲곗쓽 �엯�옄 10 6 媛� �씠�긽 �엳�떎. 20 micron �씠�긽�쓽 吏�由꾩쓣 媛뽯뒗 �엯�옄�쓽 寃쎌슦 �돺寃� 媛��씪 �븠�쑝誘�濡� 二쇰줈 臾몄젣媛� �릺�뒗 �엯�옄�뒗 0.1 to 20 micron �쓽 吏�由꾩쓣 媛뽯뒗 �엯�옄�씠�떎.
Inorganic contaminants �뿼, �슜�븸�쓽 �씠�삩, 臾닿굅�슫 metal �썝�옄. recirculation systems�씠�굹 �듅蹂꾪븳 �슜�븸�뿉 �쓽�빐 �젣嫄곕맂�떎.
Organic contaminants - smog, skin oil, fluxes, lubricants, solvent vapors, monomers from plastic tubing and storage boxes that can condense on substrate. strong oxidizers, gaseous or liquid�쓣 �씠�슜�븯�뿬 �젣嫄곕맂�떎.
Impurities- incorporated during the formation of substrates or over layer films. 蹂댄넻 �젣嫄곕릺吏� �븡�뒗�떎.
Wet cleaning
: Conversion of contaminant into a soluble compound or its washing off force by the force altering its adhesion to the surface
`�슜�룄�뿉 �뵲瑜� �빟�뭹 遺꾨쪟`
Particles
Organic
Metals
Native/Chemical oxides
APM
SPM
SPM
DHF
APM
HPM
BHF
DHF
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