¡¥pment of Process Displacement Measurement and Analysis Equipment to improve the Accuracy of Semiconductor Photo Processes," I conducted the design of the interferometer for reducing overlay misalignment error and secured all knowledge of the system used during the semiconductor process. Through the ¡°Encoder scale development¡± project, the lithography pro¡¦
[¿µ¹®ÀÚ±â¼Ò°³¼] °ÇÃà Åä¸ñ °Ç¼³ Á¶°æ 916 / 1216room 729-24 Bongcheon-dong Gwanak-gu S.KOREA TEL : +82-2-835-4993 Christine OBJECTIVE ¹®¼¼½ÄÆ÷Å»ºñÁîÆû To obtain a position with a strong progressive company were I can utilize my experience and training as a designer. ACCOMPLISHMENTS ¹®¼¼½ÄÆ÷Å»ºñÁîÆû Project Administration Specialist for $¡Û mill¡¦